New research paper titled “Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?,” from researchers at Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany).
Aim: “We review published research on attenuated phase shift masks (attPSM) for EUV with special emphasis on modeling and fundamental understanding of the imaging characteristics of alternative absorber materials. The overview on previous work is intended to summarize typical observations and learning on obtained results and to serve as a reference for further research on this important topic.”
Find the open access technical paper here. Published May 2022.
Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, “Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?,” J. Micro/Nanopattern. Mats. Metro. 21(2) 020901 (11 May 2022) https://doi.org/10.1117/1.JMM.21.2.020901.
Related Reading: Photomask Challenges At 3nm And Beyond What are the next lithography-related issues as device scaling continues to the next process nodes? Photomask Shortages Grow At Mature Nodes Aging equipment and rising demand are pushing up prices and slowing production. Business, Technology Challenges Increase For Photomasks Complexity and costs are rising, and not all litho equipment and processes are fully vetted. The Changing Mask Landscape A discussion with Mike Hermes of Micron about major photomask technology changes and the challenges EUV poses for the mask shop.
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